Loren Data's SAM Daily™

SAMDAILY.US - ISSUE OF JANUARY 26, 2023 SAM #7730
SPECIAL NOTICE

59 -- NOTICE OF INTENT TO SOLE SOURCE: Oxford Instruments America Inc. PlasmaPro 100 Cobra 300 and PlasmaPro 80 RIE Plasma Tools

Notice Date

1/24/2023 11:55:42 AM
 

Notice Type

Special Notice
 

NAICS

334516 — Analytical Laboratory Instrument Manufacturing
 

Contracting Office

DEPT OF COMMERCE NIST GAITHERSBURG MD 20899 USA
 

ZIP Code

20899
 

Solicitation Number

NB680000-23-00675
 

Response Due

2/8/2023 7:00:00 AM
 

Point of Contact

Ian Robinson, Don Collie
 

E-Mail Address

ian.robinson@nist.gov, donald.collie@nist.gov
(ian.robinson@nist.gov, donald.collie@nist.gov)
 

Description

The United States Department of Commerce (DOC), National Institute of Standards and Technology (NIST), Acquisition Management Division (AMD) intends to negotiate, on a sole source basis, with Oxford Instruments America, Inc. of 300 Baker Ave STE 150, Concord, MA 01742-2204 for the purchase of the following systems to be utilized by NIST�s Physical Measurements Laboratory (PML). The statutory authority for this acquisition is 41 USC 3304(a)(1), as implemented under the authority of 41 U.S.C. 1901.� 1 QTY, PlasmaPro� 100 Cobra 300 Metal Silicon III-V ICP Etch System. 4 year warranty (one-year base + 1 three-year option) 1 QTY, PlasmaPro� 100 Cobra 300 Cryo Si Etch Sytem. 4 year warranty (one-year base + 1 three-year option) Based on the Government�s market research, only Oxford Instruments of America, Inc. can provide a commercially available product that meets the following minimum specifications: Electrode temperature: Negative 150 degrees Celsius to positive 400 degrees Celsius. Minimum gas lines: 12 ICP power source: 0 to 3000 W Pumping system: Compatitble with chlorine-based chemistries and mainteanis a base pressure of 0.9 microTorr or lower Substrate: The system shall be able to process substrates with various sizes including 75 mm, 100 mm, 150 mm, and 200 mm diameter SEMI spec silicon substrate. Handling of 200 mm diameter SEMI-spec silicon wafers with a high-temperature lower electrode. Minimum Chamber base pressure: 0.9 micro Torr in 24 hours from atmosphere after chamber has been open. Mechanical wafer clamping required. 229 NanoFab users are currently trained in the operation of the Oxford PlasmaLab 100 and PlasmaPro 100 Cobra ICP etching systems. The user interface, software, and much of the hardware will be the similar on the new PlasmaPro 100 Cobra ICP etching system, so users will have an almost seamless transition between using the two etch systems. Changing the etch system type would require re-training of the staff and every user. The new PlasmaPro 100 Cobra ICP etching system will have similar hardware design, gas flow systems, and vacuum systems as the current Oxford Plasma ICP etching systems, so the results obtained from the new etch system will be similar. Changing the manufacturer of the etch system would also require the re-qualification of each process used by each user which would severely impair timely research progress. Oxford Instruments America, Inc. is the sole manufacturer and distributor of the commercial equipment that meets the required minimum specifications.�� The North American Industry Classification System (NAICS) code for this acquisition is 334516 � Analytical Laboratory Instrument Manufacturing, with a small business size standard of 1,000 employees.�� A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government.� Information received will be considered solely for the purpose of determining whether to conduct a competitive procurement.��� No solicitation package will be issued.� This notice of intent is not a request for quotations; however, all responsible sources interested may identify their interest and capability to respond to this requirement. Interested parties that believe they can satisfy the requirements listed above must identify their capability in writing before the response date of this notice. Only responses received by 10:00 a.m. Eastern Standard Time on February 8, 2023 will be considered by the government.� Responses shall be submitted via email to ian.robinson@nist.gov and donald.collie@nist.gov. Contracting Office Address:� 100 Bureau Drive� Bldg. 301, Mail Stop 1640� Gaithersburg, Maryland 20899-0001�
 

Web Link

SAM.gov Permalink
(https://sam.gov/opp/57ebd2bbbfda400591894556bf3e65e7/view)
 

Place of Performance

Address: Gaithersburg, MD 20899, USA

Zip Code: 20899

Country: USA
 

Record

SN06571519-F 20230126/230124230104 (samdaily.us)
 

Source

SAM.gov Link to This Notice
(may not be valid after Archive Date)

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